[:en]Company demonstrates that magnetic-field debris mitigation, a new technology, extends collector mirror lifetime in Pilot light source for EUV lithography mass production plants, a major step towards eliminating bottlenecks
Oyama, Tochigi; February 24, 2017 — Gigaphoton Inc., a leading manufacturer of light sources used in lithography, has announced that in the field of Laser-Produced Plasma (LPP) light sources for EUV scanners, which the company is currently engaged in developing, it has successfully demonstrated that debris mitigation using magnetic fields, the company’s new proprietary technology, is effective in extending the lifetime of collector mirrors in pilot light sources1 designed to operate in state-of-the-art semiconductor mass production lines, which have been a result of Japan’s National Institute for New Energy and Industrial Technology Development (NEDO) grant program.
EUV light source equipment concentrates light generated by high-intensity EUV plasma, and requires collector mirrors to then transmit this light to lithography equipment. However, when operating at high output rates the mirrors soon become contaminated with the tin being targeted by the mirror’s light, which leads to exceedingly short lifespans of collector mirrors. This challenge has been a major barrier for their practical application.
In its experiments, Gigaphoton has verified that its patented technology, which uses magnetic fields to mitigate debris, extends the lifetime of collector mirrors (with a reflectance decrease of less than 0.5% per billion pulses). These experiments involved the magnetic-field debris mitigation technology installed onto an EUV lithography pilot light source equivalent to one typically used in a mass production plant, and then operated at 100 W. The data suggests that the lifespan of collector mirrors, which was previously only a few weeks under continuous operation, can be successfully extended.
Hakaru Mizoguchi, Vice President & CTO of Gigaphoton says, “This demonstration of the effectiveness of our magnetic-field debris mitigation technology for pilot light sources designed to operate in state-of-the-art semiconductor mass production lines, shows how incredibly close we are to overcoming major technological bottlenecks and introducing the technology into the EUV light source market. We remain committed in our efforts to support overall development in the semiconductor industry and contribute to the realization of an IoT based society through the development of EUV light sources.”
1: a light source designed by Gigaphoton for use in mass production plants that use EUV lithography. Also called a” high output demonstration unit”
More information on this issue will be announced at the upcoming international symposium on advanced lithography, “SPIE Advanced Lithography 2017,” to be held from February 26 to March 2 in San Jose, California.
http://spie.org/conferences-and-exhibitions/advanced-lithography
About Gigaphoton
Since it was founded in 2000, Gigaphoton has delivered valuable solutions to semiconductor manufacturers throughout the world as a laser supplier. Gigaphoton’s patented and innovative technology of LPP EUV solutions play a leading role in achieving better cost effectiveness and productivity in EUV scanners intended for high-volume manufacturing. In every stage from R&D to manufacture, sales, and maintenance services, Gigaphoton is committed to providing world-class support delivered from the perspective of everyday users. For more information please visit www.Gigaphoton.com.
The original source-language text of this announcement is the official, authoritative version. Translations are provided as an accommodation only, and should be cross-referenced with the source-language text, which is the only version of the text intended to have legal effect.
Media contact:
Gigaphoton Inc.
Corporate Planning Department
Akinori Matsui
TEL: +81-285-37-6931
Email: web_info@gigaphoton.com
The information contained in this news release is current at the time of announcement and subject to change without notice.[:ja]量産工場対応EUVリソグラフィパイロット光源にて、新技術「磁場デブリミチゲーション」による集光ミラー寿命延長効果を実証、ボトルネック解消へ大きく前進
栃木県小山市； 2017年2月24日 — リソグラフィ光源の主要メーカーであるギガフォトン株式会社は、現在開発中のEUVスキャナー用レーザー生成プラズマ（LPP）光源について、国立研究開発法人新エネルギー・産業技術総合開発機構（NEDO）の助成プログラムの成果である、最先端半導体量産ラインでの稼働を想定したパイロット光源注） において、同社の新規独自開発技術である、磁場を使ったデブリミチゲーション（残余物除去）が、集光ミラーの長寿命化に効果的であるということを実証したと発表しました。
EUV光源装置では、高輝度のEUVプラズマから発生する光を集光し、露光装置に伝送する集光ミラーが不可欠ですが、高出力運転時ではこのミラーが発光時のターゲットである錫に汚染されるため、集光ミラーの耐用時間が非常に短いということが、実用化への大きな障害となっていました。今回ギガフォトンは、同社の特許登録済技術である磁場を使ったデブリミチゲーション技術を、100Wレベルの運転にて、量産工場対応EUVリソグラフィ用パイロット光源に搭載した実験で、集光ミラーの寿命延長効果（反射率低下率：0.5%/Billion pulse以下）を確認しました。このデータは、従来連続運転で数週間が限界であった集光ミラーの耐用時間が延長できる可能性を示唆しています。
ギガフォトン代表取締役副社長兼CTOである溝口計氏は、次のようにコメントしています。 「最先端半導体量産ラインでの稼働を想定したパイロット光源で、磁場デブリミチゲーション技術の有効性が実証されたことは、大きな技術ボトルネックが解消されEUV光源が市場導入に大きく近づいたことを示しています。我々は今後もEUV光源の開発を通じて、半導体産業の発展とIoT社会の実現に貢献していきます。」
注）ギガフォトンがEUVリソグラフィ量産工場対応仕様にて設計した光源。別名称「高出力実証機」
*本件の詳細は米国カリフォルニア州サンノゼで2月26日（米国時間）より3月2日まで開催される先端露光の国際シンポジウム(SPIE Advanced Lithography 2017)で発表予定です。
http://spie.org/conferences-and-exhibitions/advanced-lithography
ギガフォトンについて
2000年設立以来、ギガフォトンはレーザーサプライヤーとして、価値あるソリューションを世界の半導体メーカーに提供し続けています。ギガフォトンの、特許を取得した革新的技術であるLPP EUVソリューションは、費用対効果と生産性に優れた量産向けEUVスキャナーの実現に向けて先導的役割を果たしています。ギガフォトンは、研究開発から製造・販売・保守サービスまで、常にユーザー目線に立った業界最高水準のサポートをお約束します。詳細についてはwww.gigaphoton.comをご覧ください。
報道関係者向けの連絡窓口
ギガフォトン株式会社
経営企画部
松井章記
TEL: 0285-37-6931
Eメール: web_info@gigaphoton.com
ニュースリリースに記載されている情報は発表時のものであり、予告なしに変更される場合があります。
[:cs]Company demonstrates that magnetic-field debris mitigation, a new technology, extends collector mirror lifetime in Pilot light source for EUV lithography mass production plants, a major step towards eliminating bottlenecks
Oyama, Tochigi; February 24, 2017 — Gigaphoton Inc., a leading manufacturer of light sources used in lithography, has announced that in the field of Laser-Produced Plasma (LPP) light sources for EUV scanners, which the company is currently engaged in developing, it has successfully demonstrated that debris mitigation using magnetic fields, the company’s new proprietary technology, is effective in extending the lifetime of collector mirrors in pilot light sources1 designed to operate in state-of-the-art semiconductor mass production lines, which have been a result of Japan’s National Institute for New Energy and Industrial Technology Development (NEDO) grant program.
EUV light source equipment concentrates light generated by high-intensity EUV plasma, and requires collector mirrors to then transmit this light to lithography equipment. However, when operating at high output rates the mirrors soon become contaminated with the tin being targeted by the mirror’s light, which leads to exceedingly short lifespans of collector mirrors. This challenge has been a major barrier for their practical application.
In its experiments, Gigaphoton has verified that its patented technology, which uses magnetic fields to mitigate debris, extends the lifetime of collector mirrors (with a reflectance decrease of less than 0.5% per billion pulses). These experiments involved the magnetic-field debris mitigation technology installed onto an EUV lithography pilot light source equivalent to one typically used in a mass production plant, and then operated at 100 W. The data suggests that the lifespan of collector mirrors, which was previously only a few weeks under continuous operation, can be successfully extended.
Hakaru Mizoguchi, Vice President & CTO of Gigaphoton says, “This demonstration of the effectiveness of our magnetic-field debris mitigation technology for pilot light sources designed to operate in state-of-the-art semiconductor mass production lines, shows how incredibly close we are to overcoming major technological bottlenecks and introducing the technology into the EUV light source market. We remain committed in our efforts to support overall development in the semiconductor industry and contribute to the realization of an IoT based society through the development of EUV light sources.”
1: a light source designed by Gigaphoton for use in mass production plants that use EUV lithography. Also called a” high output demonstration unit”
More information on this issue will be announced at the upcoming international symposium on advanced lithography, “SPIE Advanced Lithography 2017,” to be held from February 26 to March 2 in San Jose, California.
http://spie.org/conferences-and-exhibitions/advanced-lithography
About Gigaphoton
Since it was founded in 2000, Gigaphoton has delivered valuable solutions to semiconductor manufacturers throughout the world as a laser supplier. Gigaphoton’s patented and innovative technology of LPP EUV solutions play a leading role in achieving better cost effectiveness and productivity in EUV scanners intended for high-volume manufacturing. In every stage from R&D to manufacture, sales, and maintenance services, Gigaphoton is committed to providing world-class support delivered from the perspective of everyday users. For more information please visit www.Gigaphoton.com.
The original source-language text of this announcement is the official, authoritative version. Translations are provided as an accommodation only, and should be cross-referenced with the source-language text, which is the only version of the text intended to have legal effect.
Media contact:
Gigaphoton Inc.
Corporate Planning Department
Akinori Matsui
TEL: +81-285-37-6931
Email: web_info@gigaphoton.com
The information contained in this news release is current at the time of announcement and subject to change without notice.
[:ct]用於量產工廠的EUV微影控制光源領域所採用新技術「磁場碎片清除技術」實際驗證具有延長聚光鏡使用壽命的效果，突破瓶頸邁出了一大步
栃木縣小山市–(February 24, 2017)– 微影光源的主要廠商Gigaphoton公司發布消息，在控制光源註）領域，該公司最新自主開發的磁場清除碎片（除去殘餘物）技術可以有效延長聚光鏡的使用壽命，這項成果已得到了實際驗證。這裡所說的控制光源設計套用於最先進半導體量產線，正是運用了國立研究開發法人新能源產業技術綜合開發機構（NEDO）的資助計畫的成果，目前正在持續開發中的EUV掃描器用雷射產生的電漿（LPP）光源。
在EUV光源裝置上面，聚光鏡是不可或缺的，它的作用是將高亮度的EUV電漿產生的光集聚起來並傳送給曝光裝置。但在高功率運轉的情況下，這種聚光鏡會被發光時的錫靶污染。因此，聚光鏡的使用壽命非常短，這嚴重地妨礙了實際應用。Gigaphoton此次在100W層級的運轉條件下、在量產工廠專用的EUV微影用控制光源上面採用碎片清除技術進行了實驗，證實了延長聚光鏡使用壽命的效果（反射率下降率：低於0.5%/10億脈衝）。該資料顯示，以往在連續運轉條件下使用壽命最多只有數周的聚光鏡使用壽命可以延長。其中，碎片清除技術是一種磁場技術，該公司已經取得該項技術的專利。
Gigaphoton董事長、副總經理兼技術長溝口計先生說：「在設計用於最先進的半導體量產線的控制光源領域，磁場碎片清除技術的有效性已獲得實際驗證，這顯示，已經突破重大的技術瓶頸，距離將EUV光源推向市場已經越來越近了。我們今後仍將透過EUV光源的開發為半導體產業的發展和物聯網社會的實現做出貢獻。」
註）Gigaphoton按照EUV微影量產工廠專用規格設計的光源，別名「高功率示範裝置」。
*本技術的詳細內容將在2月26日（美國時間）到3月2日於美國加州聖荷西市舉辦的先進曝光國際論壇（SPIE Advanced Lithography 2017）上發布。 http://spie.org/conferences-and-exhibitions/advanced-lithography
Gigaphoton公司簡介
Gigaphoton成立於2000年，是一家雷射供應商，自成立以來不斷為全球的半導體生產廠商提供有價值的解決方案。其中，LPP EUV解決方案是Gigaphoton公司開發的一項創新型技術，已經取得專利，為性價比及生產性優異的量產型EUV曝光機的實現充當了開路先鋒。Gigaphoton時刻以客戶為中心，從產品研發到生產、銷售及維護，為用戶提供業界最高水準的支援。關於詳細介紹請造訪本公司的網站：www.gigaphoton.com。
新聞發布稿中記載的資訊為發表時所能獲得的資訊，如有變更，恕不另行通知。
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Contacts
媒體專用聯絡窗口 Gigaphoton株式會社 經營企畫部 聯絡人： 松井章記 電話： +81-285-37-6931 電子信箱： web_info@gigaphoton.com
Source: Gigaphoton Inc.[:kr]양산 공장 대응 EUV 리소그래피 파일럿 광원으로 신기술 ‘자기장 Debris Mitigation’에 의한 집광 미러 수명연장 효과를 실증, 난관 해소를 향한 커다란 전진
오야마, 일본–(February 24, 2017)– 반도체 리소그래피 광원 주요 제조업체인 기가포톤 주식회사(본사: 토치기현 오야마시, 대표이사 사장: 토마루 히토시)는 현재 개발중인 EUV 스캐너용 레이저 생성 플라즈마 (LPP) 광원에 대한 국립연구개발법인 신에너지・산업기술종합개발기구（NEDO）의 조성 프로그램 성과인 최첨단 반도체 양산 설비 가동을 상정 한 파일럿 광원*에서 자체 개발 기술인 자기장을 이용한 Debris Mitigation(잔해물 제거법)이 집광 미러 수명연장에 효과적이라는 것을 입증했다고 발표했다.
EUV 광원 장치의 경우는 고휘도의 EUV 플라스마에서 발생하는 빛을 집광하여 노광 장치로 전송하는 집광 미러가 반드시 필요하다. 고출력 운전 시에는 이 미러가 발광 시의 타깃인 주석에 오염되기 때문에 집광 미러의 사용 기간이 너무 짧아 실용화에 커다란 장애였다. 이번에 기가포톤은 특허 등록이 완료된 기술인 자기장을 사용한 Debris Mitigation 기술을 100W 레벨의 운전에서 양산 공장 대응 EUV 리소그래피용 파일럿 광원에 탑재한 실험을 통해 집광 미러의 수명연장 효과（반사율 저하율：0.5%/10억 펄스 이하）를 확인했다. 이 데이터는 종래의 연속 운전에서 몇 주간이 한계였던 집광 미러의 사용시간을 연장할 수 있는 가능성을 시사한다.
기가포톤 대표이사 부사장 겸 CTO인 미조구치 하카루 씨는 “최첨단 반도체 양산 설비에서의 가동을 상정한 파일럿 광원으로 자기장 Debris Mitigation 기술의 유효성이 실증되므로 인해 기술의 심각한 난관을 해소하여 EUV 광원이 시장 도입에 성큼 다가서게 되었다. 기가포톤은 앞으로도 EUV 광원의 개발을 통해 반도체 산업 발전 및 IoT 사회 실현에 기여해 나가고자 한다”고 말했다.
(*) 기가포톤이 EUV 리소그래피 양산 공장 대응 사양으로 설계한 광원. 별칭 ‘고출력 실증기’
자세한 내용은 미국 캘리포니아주 새너제이에서 2월 26일(미국시간)부터 3월 2일까지 개최되는 ‘첨단 노광 국제 심포지엄(SPIE Advanced Lithography 2017)’에서 발표할 예정이다. http://spie.org/conferences-and-exhibitions/advanced-lithography
기가포톤(Gigaphoton) 개요
기가포톤은 2000년 설립이래 레이저 공급업체로서 반도체 제조사에 가치있는 솔루션을 제공해왔다. 특허를 취득한 기가포톤의 혁신적인 기술인 LPP EUV 솔루션은 비용대비 효과 및 생산성이 뛰어난 양산용 EUV 스캐너를 만들기 위해 선도적인 역할을 해왔다. 기가포톤은 초기 연구개발 단계부터 제조, 판매, 보수서비스에 이르기까지 사용자의 시각을 반영한 세계최고수준의 지원을 제공하고자 최선을 다하고 있다. 자세한 사항은 웹사이트(www.gigaphoton.com)에서 확인 할 수 있다.
보도자료에 기재된 정보는 발표시점의 정보이며, 예고 없이 변경될 수 있다.
[이 보도자료는 해당 기업에서 원하는 언어로 작성한 원문을 한국어로 번역한 것이다. 그러므로 번역문의 정확한 사실 확인을 위해서는 원문 대조 절차를 거쳐야 한다. 처음 작성된 원문만이 공식적인 효력을 갖는 발표로 인정되며 모든 법적 책임은 원문에 한해 유효하다.]
언론연락처[:]