[:en]Oyama, Tochigi; September 12, 2017 — Gigaphoton Inc., a leading manufacturer of light sources used in semiconductor lithography, announced with regard to their current development of Laser-Produced Plasma (LPP) light sources for EUV scanners, that a decrease in collector mirror reflectance of -0.4 % / Bpls has been achieved for their pilot light sources. ^Note) These sources are expected to operate in leading-edge semiconductor mass-production lines and this marks a major step forward in the resolution of bottlenecks.

This summer, through optimizing hydrogen flow and improving its proprietary technology for the removal of debris using magnetic fields, Gigaphoton measured a decrease in reflectance of -0.4% / Bpls when performing lifetime tests on pilot light sources equipped with actual collector mirrors.

This corresponds to mirror lifetime of 3months and, comparing with the same tests conducted in April (decrease in reflectance -10% / Bpls), represents a major advancement.

Gigaphoton Vice President, Hakaru Mizoguchi commented, “These results for the pilot light sources that are expected to operate in leading-edge semiconductor mass-production lines show that, with a major technological bottleneck resolved, the introduction of EUV light sources into the market is now drawing much closer. We hope to continue to contribute to the growth of the semiconductor industry through our development of EUV light sources. ”

This achievement is scheduled to be reported at “SPIE Photomask Technology + with EUV Lithography” to be held in Monterey, California 9/11 – 9/14.

Note) Light source designed by Gigaphoton for use in EUV lithography mass-production factories. Also called high output demonstration equipment.

*This work accesses the experimental results of a subsidy program under New Energy and Industrial Technology Development Organization (NEDO).

About Gigaphoton

Since it was founded in 2000, Gigaphoton has delivered valuable solutions to semiconductor manufacturers throughout the world as a light source supplier. Gigaphoton’s patented and innovative technology of LPP EUV solutions play a leading role in achieving better cost effectiveness and productivity in EUV scanners intended for high-volume manufacturing. In every stage from R&D to manufacture, sales, and maintenance services, Gigaphoton is committed to providing world-class support delivered from the perspective of everyday users. For more information please visit Welcome to Gigaphoton.

Media contact:

Gigaphoton Inc.

Corporate Planning Division

Katsutomo Terashima

Phone: +81-285-37-6931

Email: web_info@gigaphoton.com[:ja]栃木県小山市；2017年9月12日 — 半導体リソグラフィ光源の主要メーカーであるギガフォトン株式会社は、現在開発中のEUVスキャナー用レーザー生成プラズマ（LPP）光源について、最先端半導体量産ラインでの稼働を想定したパイロット光源^注）にて集光ミラー反射率低下量－0.4%/Bplsを達成し、ボトルネック解消へ大きく前進したと発表しました。

ギガフォトンは今夏、独自開発技術である磁場を使ったデブリ除去技術において、水素フローの最適化を行い、実集光ミラーを搭載したパイロット光源での寿命試験を実施し、集光ミラーの反射率低下量、-0.4%/Bplsという値を達成しました。この数値はミラー寿命3か月に相当し、4月に行った同試験（反射率低下量-10%/Bpls）に比べ大幅な進展があったといえます。

ギガフォトン代表取締役副社長の溝口計はこうコメントしています。「最先端半導体量産ラインでの稼働を想定したパイロット光源で達成した今回の結果は、大きな技術ボトルネックが解消されEUV光源が市場導入に大きく近づいたことを示しています。我々は今後もEUV光源の開発を通じて、半導体産業の発展に貢献していきます。」

*このニュースは9/11-9/14　カリフォルニア州モントレーで開催されるSPIE Photomask Technology + with EUV Lithographyにて報告予定です。

*本件は、国立研究開発法人「新エネルギー・産業技術総合開発機構（NEDO）」の助成プログラムの成果を活用しています。

注）ギガフォトンがEUVリソグラフィ量産工場対応仕様にて設計した光源。別名称「高出力実証機」

ギガフォトンについて

2000年設立以来、ギガフォトンはレーザーサプライヤーとして、価値あるソリューションを世界の半導体メーカーに提供し続けています。ギガフォトンの、特許を取得した革新的技術であるLPP EUVソリューションは、費用対効果と生産性に優れた量産向けEUVスキャナーの実現に向けて先導的役割を果たしています。ギガフォトンは、研究開発から製造・販売・保守サービスまで、常にユーザー目線に立った業界最高水準のサポートをお約束します。詳細についてはwww.gigaphoton.comをご覧ください。

報道関係者向けの連絡窓口：

[:cs]Oyama, Tochigi; September 12, 2017 — Gigaphoton Inc., a leading manufacturer of light sources used in semiconductor lithography, announced with regard to their current development of Laser-Produced Plasma (LPP) light sources for EUV scanners, that a decrease in collector mirror reflectance of -0.4 % / Bpls has been achieved for their pilot light sources. ^Note) These sources are expected to operate in leading-edge semiconductor mass-production lines and this marks a major step forward in the resolution of bottlenecks.

This summer, through optimizing hydrogen flow and improving its proprietary technology for the removal of debris using magnetic fields, Gigaphoton measured a decrease in reflectance of -0.4% / Bpls when performing lifetime tests on pilot light sources equipped with actual collector mirrors.

This corresponds to mirror lifetime of 3months and, comparing with the same tests conducted in April (decrease in reflectance -10% / Bpls), represents a major advancement.

Gigaphoton Vice President, Hakaru Mizoguchi commented, “These results for the pilot light sources that are expected to operate in leading-edge semiconductor mass-production lines show that, with a major technological bottleneck resolved, the introduction of EUV light sources into the market is now drawing much closer. We hope to continue to contribute to the growth of the semiconductor industry through our development of EUV light sources. ”

This achievement is scheduled to be reported at “SPIE Photomask Technology + with EUV Lithography” to be held in Monterey, California 9/11 – 9/14.

Note) Light source designed by Gigaphoton for use in EUV lithography mass-production factories. Also called high output demonstration equipment.

*This work accesses the experimental results of a subsidy program under New Energy and Industrial Technology Development Organization (NEDO).

About Gigaphoton

Since it was founded in 2000, Gigaphoton has delivered valuable solutions to semiconductor manufacturers throughout the world as a light source supplier. Gigaphoton’s patented and innovative technology of LPP EUV solutions play a leading role in achieving better cost effectiveness and productivity in EUV scanners intended for high-volume manufacturing. In every stage from R&D to manufacture, sales, and maintenance services, Gigaphoton is committed to providing world-class support delivered from the perspective of everyday users. For more information please visit Welcome to Gigaphoton.

Media contact:

Gigaphoton Inc.

Corporate Planning Division

Katsutomo Terashima

Phone: +81-285-37-6931

Email: web_info@gigaphoton.com[:ct]栃木縣小山市；2017年9月12日–(美國商業資訊)–半導體微影光源的主要供應商Gigaphoton株式會社發布公告，針對目前正在開發中的EUV曝光雷射等離子體光源（Laser Produced Plasma，LPP）光源，運用於最先進半導體量產製程上，試驗光源可將聚光鏡反射率降低-0.4%/Bpls，解決技術上的瓶頸取得重大進展。

今年夏天，Gigaphoton藉由使用磁場去除碎片的自主研發技術，針對氫氣流量進行最佳化的測試，利用裝載實聚光鏡的試驗光源進行壽命評估測試，得到了聚光鏡反射率下降-0.4%/Bpls的良好結果。

這一數值相當於3個月的聚光鏡壽命，這與4月份所做出的實驗數據（反射率下降-10%/Blps）相比，有了重大進展。

Gigaphoton副社長溝口計先生評論指出：「試驗光源技術成功應用於最先進半導體量產製程上，無疑是突破了重大技術瓶頸，這代表著EUV光源投入市場的距離又邁進了一步。今後，我們將繼續開發EUV光源技術，為半導體產業的發展做出貢獻。」

*本新聞稿的內容預計將在9/11-14日於加州蒙特里(Monterey)召開的SPIE光罩技術大會暨極紫外光微影會議(SPIE Photomask Technology + with EUV Lithography)上進行呈報。

*本次開發應用了國立研究開發法人「新能源・產業技術綜合開發機構（NEDO）」支援計畫的成果。

注）Gigaphoton根據對應EUV顯影量產工廠規格所設計的光源。別稱「高功率實證裝置」

Gigaphoton公司簡介

Gigaphoton公司成立於2000年，作為一家雷射器的供應商，自成立以來一直為全球的半導體生產廠商提供有價值的解決方案。目前Gigaphoton已取得專利的革命性技術LPP EUV解決方案在實現具有優秀成本效益和生產性的量產EUV掃描器的道路上發揮了先導性作用。Gigaphoton時刻以客戶為中心，從產品研發到生產、銷售及維護，為用戶提供業界最高水準的支援。更為詳細的介紹請您造訪：Welcome to Gigaphoton。

新聞發表中所記載的資訊反映的是我們發布公告時的情況，如有變更，恕不另行通知。

免責聲明：本公告之原文版本乃官方授權版本。譯文僅供方便瞭解之用，煩請參照原文，原文版本乃唯一具法律效力之版本。

Contacts

新聞媒體專用聯絡窗口

Gigaphoton株式會社

經營企劃部

寺嶋克知

電話：+81-285-37-6931

電子信箱: web_info@gigaphoton.com[:kr]

스펙트럼 폭 목표치를 변화시켜 IoT용 반도체 수요 증가에 대응

일본 오야마시–(Business Wire/뉴스와이어) 2017년 9월 12일 — 반도체 리소그래피 광원의 주요 제조업체인 기가포톤 주식회사(본사: 토치기현 오야마시, 대표이사 사장: 우라나카 카츠미)가 최신 광학 설계 제조기술(=Cutting Edge Solution)을 도입한 스펙트럼 폭 제어기술 ‘hMPL’을 개발했다고 발표했다. hMPL은 이미 칩 제조업체의 실기평가(pilot experiment)에서 높은 평가를 받았으며 향후 최첨단 반도체 제조 애플리케이션에 대응해 나갈 예정이다.

반도체 리소그래피 공정에서 스펙트럼 폭은 가장 중요한 파라미터 중 하나인데 기가포톤의 hMPL은 LNM(협대역화 모듈)의 광학적인 열부하를 절감하여 스펙트럼 폭 목표치를 종래의 300fm(펨토미터)에서 200fm로 축소했다. 또한 새로운 제어 알고리즘을 도입함으로써 상한치를 450fm까지 확대를 가능하게하였다.

hMPL의 메리트는 두 가지이며 첫 번째는 종래보다 스펙트럼 폭을 좁게 할 수 있기 때문에 콘트라스트가 향상되어 프로세스 윈도우가 넓어진다. 두 번째는 스펙트럼 폭을 변경할 수 있기 때문에 노광장치 간의 콘트라스트 차이를 조정할 수 있다. 이것은 IoT용 반도체 제조처럼 종래의 노광장치와 새로운 노광장치를 동시에 사용할 경우에 유효한 수단이 된다. 이러한 장점으로 인해 hMPL은 노광 프로세스의 여유폭을 향상시켜 프로세스의 최적화 및 칩의 생산성 향상에 기여한다.

더하여 hMPL은 2017년 말에 출하 예정인 GT65A^*에 표준 탑재된다.

대표이사 사장 우라나카 카츠미는 “스펙트럼 폭 제어기술 ‘hMPL’은 IoT 사회의 발전으로 인해 앞으로 더 늘어날 것으로 예상되는 반도체 수요에 대응하기 위해 개발되었으며. 당사는 앞으로도 최첨단 기술로 고객을 지원하면서 반도체 업계에 기여해 나가겠다”고 말했다.

^*GT65A에 관한 보도자료는 http://www.gigaphoton.com/ja/news/4938 참조

기가포톤(Gigaphoton) 개요

기가포톤은 2000년 설립 이래 레이저 공급업체로서 반도체 제조사에 가치 있는 솔루션을 제공해왔다. 기가포톤은 초기 연구개발 단계부터 제조, 판매, 보수서비스에 이르기까지 사용자의 시각을 반영한 세계최고수준의 지원을 제공하고자 최선을 다하고 있다. 자세한 사항은 웹사이트(www.gigaphoton.com)에서 확인할 수 있다.

언론 연락처

기가포톤주식회사

경영기획부

테라시마 가츠토모

+81-285-37-6931

web_info@gigaphoton.com[:]