Evolutionary Immersion Lithography Lightsource Driving Lithography Performance

Oyama, Tochigi; March 27, 2024, Gigaphoton Inc. (Head Office: Oyama, Tochigi; President and CEO: Katsumi Uranaka), a manufacturer of lightsources for semiconductor lithography, announced that “GT80A”, that is Gigaphoton’s latest ArF Immersion lithography lightsource has been shipped.

In the manufacturing of state-of-the-art devices, high productivity is required along with the scaling. Said state-of-the-art devices must meet requirements for lithography patterns transferred to wafers, especially EPE (Edge Placement Error) and high productivity. As a lightsource, by reducing CD LER/LWR (Line Edge Roughness/Line Width Roughness), which directly affects EPE, the GT80A provides improved yield at mass production sites.

The new immersion lithography lightsource “GT80A” has successfully enhanced the repetition rate by 12.5% with newly developed modules. This leads to a 36% reduction in speckle contrast compared with GT65A and contributes to further reduction of LWR/CDU.  These advancements enable further improvement on process yield and support high productivity in the production of leading-edge nodes.

Katsumi Uranaka, President and CEO of Gigaphoton said, “GT80A has been introduced to the semiconductor market with the goal of achieving stable and high-yield production for cutting-edge semiconductors in state-of-the-art process nodes. Gigaphoton will continue its efforts to drive innovation in semiconductor industry.”

About GIGAPHOTON

Since it was founded in 2000, GIGAPHOTON has delivered valuable solutions to semiconductor manufacturers throughout the world as a manufacturer of lightsources. In every stage from R&D to manufacture, sales, and maintenance services, GIGAPHOTON is committed to providing world-class support delivered from the perspective of everyday users. For more information, please visit https://gigaphoton.com/