ギガフォトンは、2月22日(日)～2月26日(木)（アメリカ時間）に開催される「SPIE Advanced Lithography 2021」（web開催）において、次の論文発表を行います。
この学会は、先端半導体の製造を担うリソグラフィ技術に関する、世界最大のイベントです。
弊社では、回路形成から基盤加工まで、多岐にわたる先端光源技術により生産歩留まりや稼働率を大きく改善するトピックスを以下の8件紹介する予定です。
- プレゼンテーション発表
February 25, 2021 • 10:50 AM PST | Session 11: EUV Source [Extreme Ultraviolet (EUV) Lithography XII]
Update of >300W High Power LPP-EUV Source Challenge III for Semiconductor HVM
Author: Hakaru Mizoguchi; Gigaphoton Inc. (Japan)
[Paper#: 11609-48]
February 24, 2021 • 9:40 AM PST | Session 4: Lithography Equipment and New Applications [Optical Lithography XXXIV]
Latest ArF light source with speckle reduction technology for immersion lithography improving chip yield
Author: Hirotaka Miyamoto; Gigaphoton Inc. (Japan)
[Paper#: 11613-11]
February 25, 2021 • 8:50 AM PST | Session 8: Novel Optical and ebeam/ion [Novel Patterning Technologies 2021]
Processability of organic material for semiconductor packaging by 248 nm excimer laser
Author: Akira Suwa; Gigaphoton Inc. (Japan)
[Paper#: 11610-27]
- ポスター発表
February 24, 2021 • 5:30 PM PST | Poster Session [Optical Lithography XXXIV]
ArF lightsource “GT66A” for next-generation immersion lithography enhancing EPE and CD performance
Author: Tommy Oga; Gigaphoton Inc. (Japan)
[Paper#: 11613-30]
February 24, 2021 • 5:30 PM PST | Poster Session [Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV]
Study of further CD and OL performance improvement by introducing new E95% spectral bandwidth and Wavelength functionality for ArFi lithography lightsource
Author: Tommy Oga; Gigaphoton Inc. (Japan)
[Paper#: 11611-92]
February 24, 2021 • 5:30 PM PST | Poster Session [Optical Lithography XXXIV]
Advanced spectral engineering: A new way of process aware laser spectra optimization for optical lithography
Author: Koichi Fujii; Gigaphoton Inc. (Japan)
[Paper#: 11613-33]
February 24, 2021 • 5:30 PM PST | Poster Session [Optical Lithography XXXIV]
Lithocell availability improvement through light source maintenance cycle improvement and optimization and its availability impact analysis for cutting-edge ArFi Light source
Author: Takehiko Tomonaga; Gigaphoton Inc. (Japan)
[Paper#: 11613-29]
February 24, 2021 • 5:30 PM PST | Poster Session [Extreme Ultraviolet (EUV) Lithography XII]
The development progress of the High Power LPP-EUV light source using a magnetic field
Author: Hirokazu Hosoda; Gigaphoton Inc. (Japan)
[Paper#: 11609-52]